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Microstructural-induced anisotropy in thin films for optical applications

Citation

Hodgkinson, IJ and Wilson, PW, Microstructural-induced anisotropy in thin films for optical applications, Critical Reviews in Solid State and Materials Sciences, 15 pp. 27-61. ISSN 1040-8436 (1988) [Refereed Article]

DOI: doi:10.1080/10408438808244624

Abstract

Materials in thin-film form are much more interesting or much more trouble than their bulk counterparts, depending on your point of view. Most coatings are deposited at substrate temperatures considerably lower than the melting points of the evaporant materials, and the trend is generally toward even lower processing temperatures. In these films, the solid material is distributed in an array of fairly closely packed columns that run perpendicular to the substrate, and it is the columnar microstructure that has substantial influence over the physical behavior of the films. The microstructure is anisotropic and so are most thin film properties.

Item Details

Item Type:Refereed Article
Research Division:Chemical Sciences
Research Group:Physical Chemistry (incl. Structural)
Research Field:Physical Chemistry not elsewhere classified
Objective Division:Expanding Knowledge
Objective Group:Expanding Knowledge
Objective Field:Expanding Knowledge in the Physical Sciences
UTAS Author:Wilson, PW (Professor Peter Wilson)
ID Code:99970
Year Published:1988
Web of Science® Times Cited:27
Deposited By:Faculty of Health
Deposited On:2015-04-22
Last Modified:2015-04-22
Downloads:0

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