Novell EUV light sources for photolithography

Two novell devices to produce Extreme Ultra Violet (EUV) light for lithographic applications are being investigated at the Kansai Plasma Laboratory. The first is a Xe plasma produced discharge using 13.56 MHz rotating magnetic field. The second is a 2.45 GHz microwave plasma produced discharge. Both devices are debris-free and produce about 10 W EUV. The overall efficiency of these devices is 0.8 % and 3 %, respectively. Scaling of the experimental data from the first device shows increasing the input power brings about improvement in the efficiency such that the 100W EUV output needed for commercial applications can be generated for input power of about 3 kW.