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An extreme ultraviolet source for photolithographic applications based on rotamak discharge

Citation

Hugrass, W and Ohnishi, M and Chikano, T and Tsukamoto, M, An extreme ultraviolet source for photolithographic applications based on rotamak discharge, Japanese Journal of Applied Physics, 49, (1) pp. 1-4. ISSN 0021-4922 (2010) [Refereed Article]


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Copyright Statement

Copyright 2010 The Japan Society of Applied Physics

DOI: doi:10.1143/JJAP.49.016201

Abstract

Xenon plasma produced in the Kansai Rotamak has been used to generate about 66W of extreme ultraviolet (EUV) radiation. The plasma in the Kansai Rotamak is produced using a rotating magnetic field (RMF) generated using a pair of 200 kHz/180kW oscillators. The plasma can be sustained for a period of 5ms limited only by the duration of applied RMF. The rotamak plasma discharge is electrodeless and its geometry is sufficiently simple to allow easy access to the emitted EUV radiation.

Item Details

Item Type:Refereed Article
Research Division:Physical Sciences
Research Group:Atomic, Molecular, Nuclear, Particle and Plasma Physics
Research Field:Plasma Physics; Fusion Plasmas; Electrical Discharges
Objective Division:Expanding Knowledge
Objective Group:Expanding Knowledge
Objective Field:Expanding Knowledge in the Physical Sciences
Author:Hugrass, W (Dr Waheed Hugrass)
ID Code:62799
Year Published:2010
Deposited By:Computing and Information Systems
Deposited On:2010-03-23
Last Modified:2012-04-20
Downloads:1 View Download Statistics

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