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An extreme ultraviolet source for photolithographic applications based on rotamak discharge
Citation
Hugrass, W and Ohnishi, M and Chikano, T and Tsukamoto, M, An extreme ultraviolet source for photolithographic applications based on rotamak discharge, Japanese Journal of Applied Physics, 49, (1) pp. 1-4. ISSN 0021-4922 (2010) [Refereed Article]
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Copyright Statement
Copyright © 2010 The Japan Society of Applied Physics
DOI: doi:10.1143/JJAP.49.016201
Abstract
Xenon plasma produced in the Kansai Rotamak has been used to generate about 66W of extreme ultraviolet (EUV) radiation. The plasma in the Kansai Rotamak is produced using a rotating magnetic field (RMF) generated using a pair of 200 kHz/180kW oscillators. The plasma can be sustained for a period of 5ms limited only by the duration of applied RMF. The rotamak plasma discharge is electrodeless and its geometry is sufficiently simple to allow easy access to the emitted EUV radiation.
Item Details
| Item Type: | Refereed Article |
|---|---|
| Research Division: | Physical Sciences |
| Research Group: | Atomic, Molecular, Nuclear, Particle and Plasma Physics |
| Research Field: | Plasma Physics; Fusion Plasmas; Electrical Discharges |
| Objective Division: | Expanding Knowledge |
| Objective Group: | Expanding Knowledge |
| Objective Field: | Expanding Knowledge in the Physical Sciences |
| Author: | Hugrass, W (Dr Waheed Hugrass) |
| ID Code: | 62799 |
| Year Published: | 2010 |
| Deposited By: | Computing and Information Systems |
| Deposited On: | 2010-03-23 |
| Last Modified: | 2012-04-20 |
| Downloads: | 1 View Download Statistics |
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