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Maskless photolithography using UV LEDs


Guijt, RM and Breadmore, MC, Maskless photolithography using UV LEDs, Lab on a Chip, 8, (8) pp. 1402-1404. ISSN 1473-0197 (2008) [Refereed Article]

DOI: doi:10.1039/b800465j


A UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 μm at a linear velocity of 80 μm s-1, while in the dry film resist Ordyl SY 330, features as narrow as 17 μm were made at a linear velocity of 245 μm s-1. At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 μm. © The Royal Society of Chemistry.

Item Details

Item Type:Refereed Article
Research Division:Chemical Sciences
Research Group:Analytical chemistry
Research Field:Separation science
Objective Division:Expanding Knowledge
Objective Group:Expanding knowledge
Objective Field:Expanding knowledge in the chemical sciences
UTAS Author:Guijt, RM (Dr Rosanne Guijt)
UTAS Author:Breadmore, MC (Professor Michael Breadmore)
ID Code:55159
Year Published:2008
Web of Science® Times Cited:42
Deposited By:Chemistry
Deposited On:2009-03-05
Last Modified:2011-08-12

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